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10/14/2016

Arie den Boef new endowed Professor on Metrology and Nanolithography

The VU appointed Arie den Boef as of October 1, 2016 as endowed Professor on Metrology and Nanolithography.

This chair will be part of the group Atoms, Molecules and Lasers of the VU Physics department. The appointment is for one day a week, for a period of five years. Arie den Boef works as a researcher at chip equipment manufacturer ASML. The new chair builds on the involvement of the VU in the Advanced Research Center for Nanolithography (ARCNL), a collaboration between ASML, the VU and UvA and FOM (NWO).

Den Boef has a strong research profile in the field of metrology techniques, coupled to nanolithography, and expertise in the field of interferometric techniques and microscopy. Metrological techniques and instrumentation are particularly important in the production of small structures through lithographic processes. Metrological techniques aim among others at determining and characterizing, at nanoscale, shape and placement of patterns after various process steps like etching.

CV
Arie den Boef obtained his engineers degree in Electrical Engineering in 1985 at the technical college in Eindhoven. He received his doctorate (with honors) at the University of Twente in 1991 in Physics with a thesis entitled ‘Scanning Force Microscopy using Optical Interferometry’. Den Boef worked for many years at Philips and since 1997 at ASML.

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